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PRODUCT
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    • PRODUCT
    • In-Line Magnetron Sputtering System
    • - Loading Chamber : Load Substrates into the Vacuum Chamber
    • - Buffer Chamber : Between Low and High Vacuum Chamber
    • - Transfer Chamber : Between Buffer and Process Chamber
    • - Process Chamber : Treatment or Deposition Process Chamber
    • - Unloading Chamber : Unload Substrates form the Vacuum Chamber
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    • Rotary Pump
    • - Maker : EDWARD
    • - Model : E2M275 (Two Stage)
    • - Displacement (Swept Volume) 50 Hz : 292 ㎥h-1
    • - Displacement (Swept Volume) 60 Hz : 350 ㎥h-1
    • - Speed 50 Hz : 255 ㎥h-1
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    • Mechanical Booster Pump
    • - Maker : EDWARD
    • - Model : EH1200
    • - Displacement (Swept Volume) 50 Hz : 1195 ㎥h-1
    • - Displacement (Swept Volume) 60 Hz : 1435 ㎥h-1
    • - Speed 50 Hz : 0 -2900 r.min-1
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    • Oil Diffusion Pump
    • - Maker : SIT
    • - Recommended oil : DOWCORNNING 704
    • - Figure : 4 Stages, 3 Ceramic Heater
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    • Turbo molecular Pump
    • - Maker : Varian, Inc.
    • - Pumping speed with ISO 250F : Ar : 2050 l/s
    • - Throughput(sccm) : >1400 for Nitrogen
    • - Base pressure(mbar) : <10-8
    • - Inlet flange : ISO 250F
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    • Cryo Pump
    • - Maker : ULVAC
    • - Model : U22H
    • - Size : 22 inch
    • - Ultimate Pressure : 10-9 Torr
    • - Cool-down Time Min : 160(50Hz) / 140(60Hz)